An X-ray photoelectron spectroscopy sputter profile study of the native air-formed oxide film on titanium

Abstract The incipient air-formed oxide film on titanium is approximately 80 A in thickness and consists of TiO 2 . Sputtering the oxide film in vacuum with 3 keV argon ions changes the composition of the oxide film. XPS depth profiles obtained by sputtering with 3 keV argon ions show that after sputtering, the outermost portion of the film consists of TiO 2 and that the inner portion consists of Ti 2 O 3 and TiO. Mathematical analysis of the sputtered oxide film as a three-layer structure shows that with increased time of sputtering, the calculated thickness of TiO 2 and its mole fraction in the oxide film decreases faster than that due solely to thinning of the outermost layer. In addition, the mole fraction of the TiO layer increases, while that of the Ti 2 O 3 remains relatively unchanged during sputtering. These observations suggest that the ion beam reduces part of the TiO 2 layer to Ti 2 O 3 , which in turn is then reduced to TiO.

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