Uniformity and signal-to-noise ratio for static and dynamic parameter designs of deposition processes
暂无分享,去创建一个
[1] Rajiv Rastogi,et al. Physical vapor deposition equipment evaluation and characterization using statistical methods , 1990 .
[2] Chi-Hao Yeh,et al. Robust design of multiple dynamic quality characteristics , 2005 .
[3] J. Hwu,et al. Improvement in ultrathin rapid thermal oxide uniformity by the control of gas flow , 2002 .
[4] J. Senturia. System of Experimental Design (Vol. 2) , 1989 .
[5] Connie M. Borror,et al. Robust Parameter Design: A Review , 2004 .
[6] Gou-Jen Wang,et al. New Optimization Strategy for Chemical Mechanical Polishing Process , 2001 .
[7] Jie-Ren Shie,et al. Optimizations of a photoresist coating process for photolithography in wafer manufacture via a radial basis neural network: A case study , 2008 .
[8] J. Pender,et al. Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher , 1998 .
[9] K. Tsui. Modeling and analysis of dynamic robust design experiments , 1999 .
[10] E. Sachs,et al. Modeling, optimization and control of spatial uniformity in manufacturing processes , 1993 .
[11] James M. Olson,et al. Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments , 2002 .
[12] Duane S. Boning,et al. A study of within-wafer non-uniformity metrics , 1999, 1999 4th International Workshop on Statistical Metrology (Cat. No.99TH8391).
[13] Janet K. Allen,et al. A review of robust design methods for multiple responses , 2005 .
[14] Genichi Taguchi,et al. Quality Engineering through Design Optimization , 1989 .
[15] Willem A. Kohler. Structural properties of vapor deposited silicon nitride , 1970 .
[16] Lee-Ing Tong,et al. Optimization of a multi-response problem in Taguchi's dynamic system , 2005, Comput. Ind. Eng..