Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics
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M. Vaněček | N. Wyrsch | J. Meier | Arvind Shah | P. Torres | U. Kroll | E. Vallat-Sauvain | C. Hof | C. Droz | M. Goerlitzer