论文信息 - Extremely small AWG demultiplexer fabricated on InP by using a double-etch Process

Extremely small AWG demultiplexer fabricated on InP by using a double-etch Process

A compact low-loss 4/spl times/4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 /spl mu/m. This small radius and a reduction of the number of array arms, reduces the device size to only 230/spl times/330 /spl mu/m/sup 2/. Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date.

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