论文信息 - Atomic Layer Deposition of Localized Boron- and Hydrogen-Doped Aluminum Oxide Using Trimethyl Borate as a Dopant Precursor - 字舞流文

Atomic Layer Deposition of Localized Boron- and Hydrogen-Doped Aluminum Oxide Using Trimethyl Borate as a Dopant Precursor

C. Detavernier | M. Nisula | T. Sajavaara | F. Mattelaer | Matthias M. Minjauw | J. Dendooven | S. D. Elliott | M. Van Daele | S. Elliott | Mikko Nisula