The effects of boron penetration on p/sup +/ polysilicon gated PMOS devices
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James D. Hayden | James R. Pfiester | T. C. Mele | Philip J. Tobin | J. W. Miller | H. Tseng | J. Hayden | J. Pfiester | C. Gunderson | P. Tobin | H.-H. Tseng | Frank K. Baker | C. D. Gunderson | Louis C. Parrillo | L. Parrillo | F. Baker | T. Mele | J. Miller
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