Steiner Tree Based Routing Algorithm in Consideration of Optical Proximity Correction

As the technology migrates into ultra deep sub-micron era, the critical dimension of the circuits has become smaller than the lithographic wavelength. Due to the unavoidable diffraction and interaction phenomena of sub-wavelength technologies, the deformations between the image on wafer and layout have become one of the major factors in performance and yield rate. Optical proximity correction is one of the critical compensation methodologies to correct the deformations as a post layout process. But the results rely much on the original layout and the process is quite time-consuming. This paper presents a detailed router that considers the optical effect in the routing algorithm. The light diffraction is pre-calculated and stored in look-up tables. These costs are used as a weight to guide the sequential routing. The constructed force directed Steiner tree routing is used to enhance routing efficiency. Experiments were done on industrial instances and results showed an efficient run-time and improvements on optical effects

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