论文信息 - Formation and Characterization of Amorphous Aluminum Nitride Powder and Transparent Aluminum Nitride Film by Chemical Vapor Deposition

Formation and Characterization of Amorphous Aluminum Nitride Powder and Transparent Aluminum Nitride Film by Chemical Vapor Deposition

Based on thermodynamic predictions that, in the gas-phase system AlCl3/NH3, AlN can be produced up to the theoretical yield, the performance of a chemical vapor deposition (CVD) reactor suitable for continuous powder production is investigated. Under the applied reaction conditions and reactor configuration, fine spherical AlN powders and transparent AlN films could be preferentially obtained. The generated amorphous CVD AlN powder is characterized by a BET surface area of 23.5 m2/g. The powder deposition rate was determined to be 3.5 g/h.

R. Riedel | K. Gaudl

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