Three-dimensional simulation of optical lithography
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[1] Andrew R. Neureuther,et al. Algorithms for three-dimensional simulation of photoresist development , 1990 .
[2] A. Neureuther,et al. Modeling projection printing of positive photoresists , 1975, IEEE Transactions on Electron Devices.
[3] A. Neureuther,et al. A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography , 1979, IEEE Transactions on Electron Devices.
[4] Takeshi Kato,et al. Resist Pattern Analysis For Submicron Feature Size Using 3-D Photolithography Simulator , 1989, Advanced Lithography.
[5] A. R. Neureuther,et al. Optical printability of defects in two‐dimensional patterns , 1988 .
[6] Akemi Moniwa,et al. A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment , 1987, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.