Most of photomask issues such as pattern collapse, HAZE, and cleaning damage relate to behavior of mask surfaces. Therefore it is coming to be important to control surface energy in photomask processes. Especially adhesion analysis in micro region is strongly desired to optimize material and process designs in photomask fabrication. Quantitative measurements of adhesive forces of resists on photomask blanks were realized with scanning probe microscopy (SPM) techniques. Then surface energy on photomask blanks was able to be controlled by modification with some silanization reagents. In addition, adhesive forces of resists on surfaces modified with some silanes were able to be also controlled. The SPM method is proved to be effective for measuring adhesive energy of micro patterns on photomask blanks.