Growth and magnetic properties dependence of the Co–Cu/Cu films electrodeposited under high magnetic fields
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F. Bohr | P. Żabiński | Qiang Wang | J. Chopart | A. Levesque | Donggang Li | R. Kowalik | M. Czapkiewicz | A. Frańczak
暂无分享,去创建一个
F. Bohr | P. Żabiński | Qiang Wang | J. Chopart | A. Levesque | Donggang Li | R. Kowalik | M. Czapkiewicz | A. Frańczak