Application of synchrotron-radiation-based x-ray microprobe techniques for the analysis of recombination activity of metals precipitated at Si/SiGe misfit dislocations

In this study we report application of synchrotron-radiation-based x-ray microprobe techniques (the x-ray-beam-induced current (XBIC) and x-ray fluorescence (μ-XRF) methods) to the analysis of the recombination activity and space distribution of copper and iron in the vicinity of dislocations in silicon/silicon–germanium structures. A combination of these two techniques enables one to study the chemical nature of the defects and impurities and their recombination activity in situ and to map metal clusters with a micron-scale resolution. XRF analysis revealed that copper formed clearly distinguishable precipitates along the misfit dislocations. A proportional dependence between the XBIC contrast and the number of copper atoms in the precipitates was established. In hydrogen-passivated iron-contaminated samples we observed clusters of iron precipitates which had no recombination activity detectable by the XBIC technique as well as iron clusters which were not completely passivated.

[1]  T. Buonassisi,et al.  X-ray beam induced current—a synchrotron radiation based technique for the in situ analysis of recombination properties and chemical nature of metal clusters in silicon , 2002 .

[2]  W. Schröter,et al.  Electrical and structural properties of nanoscale NiSi 2 precipitates in silicon , 2000 .

[3]  T. Tan,et al.  Schottky effect model of electrical activity of metallic precipitates in silicon , 2000 .

[4]  A. Istratov,et al.  Iron contamination in silicon technology , 2000 .

[5]  R. Celestre,et al.  Synchrotron-based impurity mapping , 2000 .

[6]  W. Schröter,et al.  Electrical and recombination properties of copper-silicide precipitates in silicon , 1998 .

[7]  E. Weber,et al.  Electrical properties and recombination activity of copper, nickel and cobalt in silicon , 1998 .

[8]  M. Kittler,et al.  Influence of copper contamination on recombination activity of misfit dislocations in SiGe/Si epilayers: Temperature dependence of activity as a marker characterizing the contamination level , 1995 .

[9]  W. Schröter,et al.  Structural and Electrical Properties of NiSi2 Particles in Silicon , 1995 .

[10]  M. Kittler,et al.  Recombination Activity of Misfit Dislocations in Silicon , 1993 .

[11]  W. Schröter,et al.  Recombination properties of structurally well defined NiSi2 precipitates in silicon , 1991 .

[12]  Schad,et al.  New insight into silicide formation: The creation of silicon self-interstitials. , 1990, Physical review letters.

[13]  C. Donolato The space-charge region around a metallic platelet in a semiconductor , 1993 .

[14]  C. Donolato A theoretical study of the charge collection contrast of localized semiconductor defects with arbitrary recombination activity , 1992 .