论文信息 - ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Repair and printability of 193nm alternating aperture phase shift masks have been studied in detail in an effort to understand the overall production capability of these masks for wafer production at the 100nm node and below.

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