论文信息 - Photoresists based on chalcogenide glasses for submicron lithography

Photoresists based on chalcogenide glasses for submicron lithography

It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.

[1] J. T. Chen,et al. Inorganic resist for dry processing and dopant applications , 1979 .

[2] S. Zembutsu,et al. Relief‐type diffraction grating by amorphous chalcogenide films , 1975 .

[3] Michael N. Kozicki,et al. High‐resolution electron beam lithography with negative organic and inorganic resists , 1988 .