On the use of methane as a carbon precursor in Chemical Vapor Deposition of silicon carbide
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E. Janzén | I. Ivanov | O. Kordina | H. Pedersen | P. Sukkaew | Ö. Danielsson | Milan Yazdanfar | E. Janzén
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E. Janzén | I. Ivanov | O. Kordina | H. Pedersen | P. Sukkaew | Ö. Danielsson | Milan Yazdanfar | E. Janzén