Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources.

The single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources are theoretically investigated, using a model developed on the basis of experimental data obtained at the FLASH and LCLS free electron lasers. We compare the radiation hardness of commonly used multilayer optics and propose new material combinations selected for a high damage threshold. Our study demonstrates that the damage thresholds of multilayer optics can vary over a large range of incidence fluences and can be as high as several hundreds of mJ/cm(2). This strongly suggests that multilayer mirrors are serious candidates for damage resistant optics. Especially, multilayer optics based on Li(2)O spacers are very promising for use in current and future short-wavelength radiation sources.

[1]  J. Susini,et al.  Table-top water window transmission x-ray microscopy: Review of the key issues, and conceptual design of an instrument for biology , 2005 .

[2]  M M Murnane,et al.  Bright, coherent, ultrafast soft X-ray harmonics spanning the water window from a tabletop light source. , 2010, Physical review letters.

[3]  E. Ziegler,et al.  Optimization of multilayer reflectivity and bandpass for soft to hard x‐ray applications [0.1–200 keV] , 1996 .

[4]  H. Sinn,et al.  Amorphous to crystalline phase transition in carbon induced by intense femtosecond x-ray free-electron laser pulses , 2012 .

[5]  Igor A. Artyukov,et al.  Carbon window soft x-ray imaging using multilayer optics , 2005, SPIE Optics + Photonics.

[6]  Eric Louis,et al.  Nanometer interface and materials control for multilayer EUV-optical applications , 2011 .

[7]  Arthur E. Morris,et al.  Handbook on material and energy balance calculations in materials processing , 2011 .

[8]  F. Schäfers Multilayers for the EUV/soft X-ray range , 2000 .

[9]  Saša Bajt,et al.  Thermal and stress studies of normal incidence Mo/B4C multilayers for a 6.7 nm wavelength. , 2011, Applied optics.

[10]  F. Salmassi,et al.  Progress in short period multilayer coatings for water window applications , 2006 .

[11]  Jorge J. Rocca,et al.  Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation , 2009 .

[12]  Eric Louis,et al.  Spectral properties of La/B--based multilayer mirrors near the boron K absorption edge. , 2012, Optics express.

[13]  N N Salashchenko,et al.  Cr /sc multilayers for the soft-x-ray range. , 1998, Applied optics.

[14]  E. Gullikson,et al.  Atomic scale interface engineering by modulated ion-assisted deposition applied to soft x-ray multilayer optics. , 2008, Applied optics.

[15]  R. London,et al.  Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources. , 2011, Optics express.

[16]  F. Bijkerk,et al.  Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements. , 2011, Optics letters.

[17]  J. Kirz,et al.  Soft X-ray microscopes and their biological applications , 1995, Quarterly Reviews of Biophysics.

[18]  E. D. van Hattum,et al.  Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. , 2010, Optics express.

[19]  Charles M. Falco,et al.  Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. , 1996, Applied optics.

[20]  U. Vogt,et al.  Laboratory cryo soft X-ray microscopy. , 2012, Journal of structural biology.

[21]  E. Anderson,et al.  Soft X-ray microscopy at a spatial resolution better than 15 nm , 2005, Nature.

[22]  M. Piecuch Diffusion in multilayers , 1988 .

[23]  Eric M. Gullikson,et al.  Multilayers for next generation EUVL at 6.X nm , 2011, Optics + Optoelectronics.

[24]  R. London,et al.  Ionization by impact electrons in solids: Electron mean free path fitted over a wide energy range , 2005, cond-mat/0506136.

[25]  J. Rocca,et al.  Demonstration of a desk-top size high repetition rate soft x-ray laser. , 2005, Optics express.

[26]  S. I. Sagitov,et al.  Thermal stability of soft x-ray Mo-Si and MoSi(2)-Si multilayer mirrors. , 1993, Applied optics.

[27]  Finn Erland Christensen,et al.  Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite , 1995, Optics & Photonics.

[28]  Ryszard S. Romaniuk,et al.  Operation of a free-electron laser from the extreme ultraviolet to the water window , 2007 .

[29]  B. Rus,et al.  Plasma-based X-ray laser at 21 nm for multidisciplinary applications , 2009 .

[30]  Armin Bayer,et al.  Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source. , 2010, Optics express.

[31]  David L. Windt,et al.  IMD—software for modeling the optical properties of multilayer films , 1998 .

[32]  A. Sakdinawat,et al.  Nanoscale X-ray imaging , 2009 .