Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.

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