Plasma generation by inductive coupling with a planar resonant RF network antenna
暂无分享,去创建一个
[1] Pascal Chabert,et al. Physics of radio-frequency plasmas , 2011 .
[2] G. Yeom,et al. Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system , 2008 .
[3] P. Guittienne,et al. Towards an optimal antenna for helicon waves excitation , 2005 .
[4] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing: Lieberman/Plasma 2e , 2005 .
[5] J. Schmitt,et al. Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor , 2004 .
[6] Jane P. Chang,et al. Lecture Notes on Principles of Plasma Processing , 2003 .
[7] D. Vender,et al. Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis , 1999 .
[8] Jianming Jin. Electromagnetic Analysis and Design in Magnetic Resonance Imaging , 1998 .
[9] L. Mahoney,et al. Radio frequency inductive discharge source design for large area processing , 1996 .
[10] Hood Chatham,et al. Oxygen diffusion barrier properties of transparent oxide coatings on polymeric substrates , 1996 .
[11] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[12] Jeffrey Hopwood,et al. Review of inductively coupled plasmas for plasma processing , 1992 .