Fabrication of a nano-scale NAND memory array based on a SONOS Fin-FET cell using e-beam lithography and hydrogen-silsesquioxane resist
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J. Kretz | W. Weber | M. Specht | L. Dreeskornfeld | L. Risch | W. Rösner | T. Lutz | C. Friederich
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J. Kretz | W. Weber | M. Specht | L. Dreeskornfeld | L. Risch | W. Rösner | T. Lutz | C. Friederich