Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
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Neal Lafferty | Joy Cheng | Charles T. Rettner | Kafai Lai | Chi-Chun Liu | Jed W. Pitera | Melia Tjio | Joy Y. Cheng | Noel Arellano | C. Rettner | J. Pitera | K. Lai | N. Arellano | Melia Tjio | N. Lafferty | Chi-Chun Liu
[1] Joy Y. Cheng,et al. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist. , 2010, ACS nano.
[2] Roel Gronheid,et al. Towards an all-track 300 mm process for directed self-assembly , 2011 .
[3] R. Ruiz,et al. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly , 2008, Science.
[4] Lars Liebmann,et al. Reducing DfM to practice: the lithography manufacturability assessor , 2006, SPIE Advanced Lithography.
[5] William D. Hinsberg,et al. Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab , 2011, Advanced Lithography.
[6] Marcus Müller,et al. Monte carlo simulation of coarse grain polymeric systems. , 2009, Physical review letters.
[7] C. Rettner,et al. Directed Self-Assembly of Lamellar Microdomains of Block Copolymers Using Topographic Guiding Patterns , 2009 .
[8] Eungnak Han,et al. Integration of block copolymer directed assembly with 193 immersion lithography , 2010 .