MBE-grown high κ gate dielectrics of HfO2 and (Hf-Al)O2 for Si and III-V semiconductors nano-electronics
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Y. J. Lee | Y. D. Wu | S. Maikap | M. Tsai | J. Kwo | M. Hong | J. Mannaerts | P. Chang | Fu-Rong Chen | Shih-Yen Lin | Yi-Lin Huang | R. Lo | W. Hsieh | L. Lee | W. Lee | Y. Hsu | T. Gustffson