Metalorganic chemical vapor deposition of lead-free ferroelectric BiFeO3 films for memory applications
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Y. J. Lee | T. Zhao | R. Ramesh | S. Y. Yang | Y. Chu | V. Vaithyanathan | D. Schlom | Q. Zhan | M. P. Cruz | F. Zavaliche | L. Mohaddes-Ardabili | S. Yang | M. Cruz