Models for predicting the index of refraction of compounds at 193 and 589-nm

A simple empirical model is presented that predicts the index of refraction at 589 nm (D-line) and 193 nm for molecules based solely on chemical structure. The model was built by comparing literature values of refractive indices (sodium D-line 589 nm) of compounds with representative functionalities and has 18 adjustable parameters. Published values for nD and n193 were used to extrapolate the predictions from values of nD to values of n193. These simple, accessible models can be run using only Excel software on a laptop computer.

[1]  Shinji Ando,et al.  DFT Calculations on Refractive Index Dispersion of Fluoro-compounds in the DUV-UV-Visible Region , 2006 .

[2]  Sheng Peng,et al.  Second generation fluids for 193nm immersion lithography , 2006, SPIE Advanced Lithography.

[3]  Charles C. Price,et al.  Spectra and Molecular Refraction for Some Unsaturated Sulfides, Sulfoxides and Sulfones , 1953 .

[4]  Jan Mulkens,et al.  Immersion lithography exposure systems: today's capabilities and tomorrow's expectations , 2004, SPIE Advanced Lithography.

[5]  James Leicester,et al.  98. Physical properties and chemical constitution. Part XXIV. Aliphatic aldoximes, ketoximes, and ketoxime O-alkyl ethers, NN-dialkylhydrazines, aliphatic ketazines, mono- and di-alkylaminopropionitriles, alkoxypropionitriles, dialkyl azodiformates, and dialkyl carbonates. Bond parachors, bond refra , 1952 .

[6]  Osamu Yokokoji,et al.  The modeling of immersion liquid by using quantum chemical calculation , 2004, SPIE Advanced Lithography.

[7]  Julius Joseph Santillan,et al.  A study of 193-nm immersion lithography using novel high refractive index fluids , 2006 .

[8]  M. T. B. Geller,et al.  Molecular , 2019, Modern Pathology.

[9]  Simon G. Kaplan,et al.  High-index materials for 193 nm immersion lithography , 2004, SPIE Advanced Lithography.

[10]  Simon G Kaplan,et al.  Optical properties of fluids for 248 and 193 nm immersion photolithography. , 2006, Applied optics.

[11]  Neal Lafferty,et al.  Immersion lithography fluids for high NA 193 nm lithography , 2004, SPIE Advanced Lithography.

[12]  J. Gálvez,et al.  Definition of a novel atomic index for QSAR: the refractotopological state. , 2004, Journal of pharmacy & pharmaceutical sciences : a publication of the Canadian Society for Pharmaceutical Sciences, Societe canadienne des sciences pharmaceutiques.

[13]  Roger H. French,et al.  Second generation fluids for 193 nm immersion lithography , 2004, SPIE Advanced Lithography.