论文信息 - Preparation of Lithium Niobate Thin Film by Thermal Chemical Vapor Deposition

Preparation of Lithium Niobate Thin Film by Thermal Chemical Vapor Deposition

Polycrystalline LiNbO3 films were prepared using the metalorganic compounds, Li(DPM) and Nb(OC2H5)5, by thermal chemical vapor deposition at 5 Torr in the temperature range of 873–1023 K. The range of operation conditions for pure LiNbO3 growth using Nb(OC2H5)5 is wider than that using Nb(DPM)2Cl3 as the Nb source. The distribution of growth rate in the reactor and that of step coverage in chemical-vapor-deposited LiNbO3 are governed by the Nb2O5 growth process, and the reactivity of Nb(OEt)5 is considerably higher than that of Nb(DPM)2Cl3.

N. Imaishi | Y. Akiyama | M. Yoshida | Y. Shin | S. Jung

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