Stabilization of higher-κ tetragonal HfO2 by SiO2 admixture enabling thermally stable metal-insulator-metal capacitors
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P. Kirsch | B. Lee | J. Heitmann | W. Krautschneider | T. Böscke | U. Schröder | B. Gnade | C. Krug | P. Hung | S. Govindarajan | G. Pant