P-224L: Late-News Poster: Enhancing the Optical Resolution of a Mask Metrology System using a Software Algorithm
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Per Liden | Lars Bergman | Peter Ekberg | Lars Stiblert | Mikael Wahlsten | John-Oscar Larson | Axel von Sydow
[1] John M. Whittey,et al. Stage Cartesian self-calibration: a second method , 1998, Photomask Technology.
[2] Michael R. Raugh. Error estimation for lattice methods of stage self-calibration , 1997, Advanced Lithography.