The dissociative recombination of CF+3

The dissociative recombination rate coefficient for CF+3 has been measured at 300 K using a flowing afterglow Langmuir probe-mass spectrometer (FALP-MS) apparatus. A value of (2.8 ± 0.8) × 10−7 cm3 s−1 has been found. This is about a factor of 3 less than values for this reaction, commonly used in plasma models.

[1]  Jonathan Tennyson,et al.  Electron collisions with the CF3 radical using the R-matrix method , 2003 .

[2]  J. Tennyson,et al.  Electron collisions with the CF radicals using the R-matrix method , 2003 .

[3]  Takashi Kimura,et al.  Model and probe measurements of inductively coupled CF4 discharges , 2002 .

[4]  J. Tennyson,et al.  Electron collisions with the CF2 radical using the R-matrix method , 2002 .

[5]  M. Larsson,et al.  Resonant ion-pair formation and dissociative recombination in electron collisions with ground-state HF+ ions , 2001 .

[6]  K. Nanbu,et al.  Self-Consistent Particle Simulation of Radio Frequency CF4Discharge: Effect of Gas Pressure , 2000 .

[7]  L. Christophorou,et al.  Electron Interactions With Plasma Processing Gases: An Update for CF4, CHF3, C2F6, and C3F8 , 1999 .

[8]  M. Larsson,et al.  Resonant Ion Pair Formation in Electron Collisions with Ground State Molecular Ions , 1999 .

[9]  L. Christophorou,et al.  Electron Interactions with CF4 , 1996 .

[10]  E. Gogolides,et al.  RADIO-FREQUENCY PLASMAS IN CF4 : SELF-CONSISTENT MODELING OF THE PLASMA PHYSICS AND CHEMISTRY , 1995 .

[11]  D. Smith,et al.  9 - Swarm Techniques , 1995 .

[12]  Loucas G. Christophorou,et al.  Linking the Gaseous and Condensed Phases of Matter , 1994 .

[13]  E. Illenberger Anion Formation in Low Energy Electron Impact to Gaseous and Condensed Molecules , 1994 .

[14]  A. Viggiano,et al.  Chemistry of CFn+ (n = 1-3) ions with halocarbons , 1992 .

[15]  J. Mitchell,et al.  A further study of HCO+ dissociative recombination , 1992 .

[16]  E. Illenberger,et al.  Gas phase negative ion chemistry , 1989 .

[17]  N. Adams,et al.  Measurements of the dissociative recombination coefficients for several polyatomic ion species at 300 K , 1988 .

[18]  Daniel L. Flamm,et al.  Computer simulation of a CF4 plasma etching silicon , 1984 .

[19]  C. R. Brundle,et al.  Electronic Energies and Electronic Structures of the Fluoromethanes , 1970 .

[20]  M. A. Biondi,et al.  ELECTRON TEMPERATURE DEPENDENCE OF RECOMBINATION OF O$sub 2$$sup +$ AND N$sub 2$$sup +$ IONS WITH ELECTRONS. , 1969 .