Characterization and corrosion evaluation of high‐entropy TixNb0.5MnMo0.5Zr0.3 (x = 0.5, 0.75, 1) thin films for biomedical applications

In the present study, high‐entropy TixNb0.5MnMo0.5Zr0.3 (x = 0.5, 0.75, 1) thin films with excellent corrosion behavior were deposited on AISI 316L using direct current magnetron sputtering. The deposited films were structurally characterized using X‐ray diffraction and field‐emission scanning electron microscopy. The results confirmed the formation of an face‐centered cubic structure with a uniform distribution of constituent elements. It was shown that the crystal structure of thin films was independent of the Ti content. The corrosion properties of the films were evaluated using electrochemical impedance spectroscopy (EIS) and polarization examinations at 37°C in the simulated body fluid electrolyte. Based on the EIS results, the stability range of the passive layer was improved by increasing the Ti content. The potentiodynamic polarization curves demonstrated that the film with a higher Ti content had the lowest icorr, indicating more corrosion resistance than other films with a lower Ti content and substrate. Another reason for the superior corrosion performance of the thin film with a higher amount of Ti was correlated with its quasi‐columnar structure. In general, the improvement of the corrosion behavior of the thin films can be associated with the chemical composition and microstructure formed during the deposition process.

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