A lifetime study of EUV masks
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Obert Wood | Monica Barrett | Emily Gallagher | Louis Kindt | Tom Wallow | Uzodinma Okoroanyanwu | Hirokazu Kato | John Whang
[1] W. Kern. The Evolution of Silicon Wafer Cleaning Technology , 1990 .
[2] Iacopo Mochi,et al. Particle removal challenges of EUV patterned masks for the sub-22nm HP node , 2010, Advanced Lithography.
[3] John Arnold,et al. The use of EUV lithography to produce demonstration devices , 2008, SPIE Advanced Lithography.
[4] David L. Windt,et al. IMD—software for modeling the optical properties of multilayer films , 1998 .