In Situ Time-dependent Dielectric Breakdown in the Transmission Electron Microscope: A Possibility to Understand the Failure Mechanism in Microelectronic Devices.
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M. Gall | E. Zschech | M. Hauschildt | A. Clausner | U. Mühle | O. Aubel | A. Beyer | K. Yeap | Z. Liao | J. Gluch | Y. Standke | C. Sander