Synthesis of ArF photoresist polymer composed of three methacrylate monomers via reversible addition-fragmentation chain transfer (RAFT) polymerization
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Y. H. Kim | Jae Hyun Kim | Jae Woo Lee | Jong‐Chan Lee | Dong‐Gyun Kim | Hae-Sung Sohn | Sang-Ho Cha | Jaehyun Kim | Myung-Sun Kim | Wonhwa Lee | H. Yun | B. Kim | Jeongsik Kim | Deogbae Kim | Jong‐Chan Lee | Youngho Kim | Jae-Woo Lee