Method for correcting critical dimension of reticle pattern and reticle manufacturing method including the same

The present invention relates to a reticle manufacturing process comprising modification method and him threshold of the reticle pattern. His compensation method, the local plasma onto said reticle pattern comprising the steps of: obtaining an image of the reticle pattern, having the steps of: obtaining first number threshold of the reticle pattern in the image, the first number threshold value with the obtained to provide a step of correcting at least one of the first critical dimension to be the second threshold value.