Development of attenuating PSM shifter for F2 and high-transmission ArF lithography
暂无分享,去创建一个
Satoshi Yusa | Naoya Hayashi | Hiroshi Mohri | Shiho Sasaki | Toshiyuki Suzuki | Hideaki Mitsui | Masao Ushida | Yasushi Ohkubo | Toshiharu Nishimura | Osamu Nozawa | Kenji Noguchi | Yuki Shiota
[1] Hideki Suda,et al. Development of halftone phase-shift blank and mask fabrication for ArF lithography , 2000, Photomask Japan.
[2] Toshiaki Motonaga,et al. The development of bilayered TaSiOx-HTPSM (1) , 2001 .