Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas
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Shuyan Xu | C. Diong | Shuyan Xu | M. Yu | I. Denysenko | C. H. Diong | M. Y. Yu | Igor Denysenko | Kostya Ostrikov | K. Ostrikov
[1] D. Sheehan,et al. Positively charged dust crystals induced by radiative heating , 1999 .
[2] I. Schweigert,et al. Coagulation in a low-temperature plasma , 1996 .
[3] Michael Keidar,et al. Influence of an electrical field on the macroparticle size distribution in a vacuum arc , 1999 .
[4] D. Mendis,et al. UV-induced Coulomb crystallization in a dusty gas , 1995 .
[5] Shuyan Xu,et al. Diagnostics and two-dimensional simulation of low-frequency inductively coupled plasmas with neutral gas heating and electron heat fluxes , 2002 .
[6] A. Matsuda,et al. Spatial Distribution of SiH3 Radicals in RF Silane Plasma , 1990 .
[7] Yu,et al. Surface waves in strongly irradiated dusty plasmas , 2000, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[8] Takashi Hirao,et al. Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma , 1997 .
[9] Vladimirov,et al. Equilibrium and levitation of dust in a collisional plasma with ionization , 2000, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[10] E. Fortunato,et al. Role of ion bombardment and plasma impedance on the performances presented by undoped a-Si:H films , 2001 .
[11] G. Kroesen,et al. Surface modification of powder particles by plasma deposition of thin metallic films , 1998 .
[12] K. Tachibana,et al. Molecular composition of films and solid particles polymerized in fluorocarbon plasmas , 2001 .
[13] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[14] A. Bouchoule,et al. Industrial developments of scientific insights in dusty plasmas , 2002 .
[15] A. Bouchoule,et al. Particulate formation and dusty plasma behaviour in argon-silane RF discharge , 1993 .
[16] W. Stoffels,et al. Surface processes of dust particles in low pressure plasmas , 2001 .
[17] S. Vladimirov,et al. Self-Organization and Dynamics of Nanoparticles in Chemically Active Plasmas for Low-Temperature Deposition of Silicon and Carbon-Based Nanostructured Films , 2003 .
[18] H. Estrade-szwarckopf,et al. Role of the surface roughness in laser induced crystallization of nanostructured silicon films , 2000 .
[19] E. T. WHITTAKER,et al. Partial Differential Equations of Mathematical Physics , 1932, Nature.
[20] Darrell G. Schlom,et al. Oxide nano-engineering using MBE , 2001 .
[21] M. Keidar,et al. Macroparticle reflection from a biased substrate in a vacuum arc deposition system , 1999 .
[22] Leonard C. Feldman,et al. Electronic thin film science : for electrical engineers and materials scientists , 1996 .
[23] André Bouchoule,et al. Dusty plasmas : physics, chemistry, and technological impacts in plasma processing , 2000 .
[24] H. Sugai,et al. Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions , 2001 .
[25] Gregor E. Morfill,et al. Complex plasmas: I. complex plasmas as unusual state of matter , 2002 .
[26] K. Tu,et al. Thermoelectric characterization of Si thin films in silicon-on-insulator wafers , 1999 .
[27] J. Perrin,et al. The physics of plasma-enhanced chemical vapour deposition for large-area coating: industrial application to flat panel displays and solar cells , 2000 .
[28] M. Kushner,et al. Simulation of the bulk and surface properties of amorphous hydrogenated silicon deposited from silane plasmas , 1989 .
[29] Mark J. Kushner,et al. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon , 1988 .
[30] M. Childs,et al. Small particle growth in silane radio-frequency discharges , 2000 .
[31] J. Boeuf,et al. Transition from a capacitive to a resistive regime in a silane radio frequency discharge and its possible relation to powder formation , 1992 .
[32] W. Goedheer,et al. A PIC-MC simulation of the effect of frequency on the characteristics of VHF SiH4/H2 discharges , 1999 .
[33] J. Goree,et al. Fluctuations of the charge on a dust grain in a plasma , 1994 .
[34] M. Nishitani,et al. Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductively-Coupled Plasma , 2001 .
[35] H. Ohkura,et al. Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films , 1996 .
[36] S. Brown,et al. Fundamentals of plasma physics , 1977 .
[37] Gallagher. Model of particle growth in silane discharges , 2000, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[38] Hideo Sugai,et al. Standing surface waves in a dust-contaminated large-area planar plasma source , 1999 .
[39] S. Vladimirov,et al. DISSIPATIVE DRIFT WAVES IN PARTIALLY IONIZED PLASMAS CONTAINING HIGH-Z IMPURITIES OR DUST , 1998 .
[40] G. Kroesen,et al. Micro-disperse particles in plasmas: From disturbing side effects to new applications , 2001 .
[41] V. Nagarajan,et al. Epitaxial La-doped SrTiO3 on silicon: A conductive template for epitaxial ferroelectrics on silicon , 2002 .
[42] Jonathan P. Williams,et al. Overview of growth and behaviour of clusters and particles in plasmas , 1994 .
[43] T. Matsoukas,et al. Stochastic charge fluctuations in dusty plasmas , 1996 .
[44] M. Shiratani,et al. Growth of particles in cluster-size range in low pressure and low power SiH4 rf discharges , 1999 .
[45] N. A. Azarenkov,et al. The radial structure of a plasma column sustained by a surface wave , 2000 .
[46] U. Kortshagen,et al. Modelling of silicon hydride clustering in a low-pressure silane plasma , 2000 .
[47] U. Kortshagen,et al. Plasma chemistry and growth of nanosized particles in a C2H2 RF discharge , 2001 .
[48] M. Takai,et al. Effect of higher-silane formation on electron temperature in a silane glow-discharge plasma , 2000 .
[49] U. Kortshagen,et al. Modeling of particulate coagulation in low pressure plasmas. , 1999, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.
[50] Chuang‐Chuang Tsai,et al. Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon , 1986 .
[51] D. A. Mendis,et al. Secondary emission from small dust grains at high electron energies , 1994 .
[52] A. Fridman,et al. Dusty plasma formation: Physics and critical phenomena. Theoretical approach , 1996 .
[53] A. Piel,et al. Dynamical processes in complex plasmas , 2002 .
[54] P. Roca i Cabarrocas,et al. Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films , 2000 .
[55] Hirotaka Toyoda,et al. Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma. , 1999 .
[56] M. Keidar,et al. Macroparticle separation and plasma collimation in positively biased ducts in filtered vacuum arc deposition systems , 1999 .
[57] C. Hollenstein. The physics and chemistry of dusty plasmas , 2000 .