Role of neural networks and genetic algorithms in developing intelligent quality controllers for on-line parameter design
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[1] Michael I. Jordan,et al. Advances in Neural Information Processing Systems 30 , 1995 .
[2] Kurt Hornik,et al. Multilayer feedforward networks are universal approximators , 1989, Neural Networks.
[3] C. Spanos,et al. Statistical experimental design in plasma etch modeling , 1991 .
[4] Richard P. Lippmann,et al. An introduction to computing with neural nets , 1987 .
[5] D. Manos,et al. Plasma etching : an introduction , 1989 .
[6] C. Ferrar. Glow discharge processes; Sputtering and plasma etching , 1981, IEEE Journal of Quantum Electronics.
[7] S. Hyakin,et al. Neural Networks: A Comprehensive Foundation , 1994 .
[8] Esther Levin,et al. A statistical approach to learning and generalization in layered neural networks , 1989, Proc. IEEE.
[9] Megan Pledger. Observable Uncontrollable Factors in Parameter Design , 1996 .
[10] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[11] John H. Holland,et al. Adaptation in Natural and Artificial Systems: An Introductory Analysis with Applications to Biology, Control, and Artificial Intelligence , 1992 .
[12] Sidney Addelman,et al. trans-Dimethanolbis(1,1,1-trifluoro-5,5-dimethylhexane-2,4-dionato)zinc(II) , 2008, Acta crystallographica. Section E, Structure reports online.
[13] Gary S. May,et al. Advantages of plasma etch modeling using neural networks over statistical techniques , 1993 .
[14] D. Montgomery. USING FRACTIONAL FACTORIAL DESIGNS FOR ROBUST PROCESS DEVELOPMENT , 1990 .
[15] A. Linden,et al. Inversion of multilayer nets , 1989, International 1989 Joint Conference on Neural Networks.
[16] R. N. Kackar. Off-Line Quality Control, Parameter Design, and the Taguchi Method , 1985 .
[17] David E. Goldberg,et al. Genetic Algorithms in Search Optimization and Machine Learning , 1988 .
[18] P. E. Riley,et al. Study of etch rate characteristics of SF/sub 6//He plasmas by response-surface methodology: effects of interelectrode spacing , 1989 .
[19] Gary S. May,et al. An optimal neural network process model for plasma etching , 1994 .
[20] Genichi Taguchi. System Of Experimental Design: Engineering Methods To Optimize Quality And Minimize Costs , 1987 .
[21] Casimir C. Klimasauskas,et al. Dynamic neural control for a plasma etch process , 1997, IEEE Trans. Neural Networks.
[22] R. H. Myers,et al. Response Surface Alternatives to the Taguchi Robust Parameter Design Approach , 1992 .
[23] G. Geoffrey Vining,et al. Combining Taguchi and Response Surface Philosophies: A Dual Response Approach , 1990 .
[24] Gunar E. Liepins,et al. Genetic algorithms: Foundations and applications , 1990 .
[25] G. Geoffrey Vining,et al. Taguchi's parameter design: a panel discussion , 1992 .
[26] Jacek M. Zurada,et al. Introduction to artificial neural systems , 1992 .
[27] Sholom M. Weiss,et al. Computer Systems That Learn , 1990 .
[28] Kurt Hornik,et al. FEED FORWARD NETWORKS ARE UNIVERSAL APPROXIMATORS , 1989 .
[29] Edward A. Rietman,et al. Use of neural networks in modeling semiconductor manufacturing processes: an example for plasma etch modeling , 1993 .
[30] Alice M. Agogino,et al. Use of influence diagrams and neural networks in modeling semiconductor manufacturing processes , 1991 .
[31] Anne C. Shoemaker,et al. Robust design: A cost-effective method for improving manufacturing processes , 1986, AT&T Technical Journal.
[32] Ravindra Khattree,et al. ROBUST PARAMETER DESIGN : A RESPONSE SURFACE APPROACH , 1996 .
[33] David Haussler,et al. What Size Net Gives Valid Generalization? , 1989, Neural Computation.