Study of TiAlN coatings deposited by continuous high power magnetron sputtering (C-HPMS)
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P. Chu | Xiaoyuan Li | R. Fu | X. Tian | Suihan Cui | Zhongzhen Wu | Liangliang Liu | Qingdong Ruan | Tijun Li | Zhongcan Wu | A. Qasim | Wei‐Yeh Tang | Lin Zhou