Remote plasma cleaning of optical surfaces: Cleaning rates of different carbon allotropes as a function of RF powers and distances
暂无分享,去创建一个
I. Šics | A. Goñi | E. Pellegrin | M. Cuxart | J. Reyes-Herrera | I. vSics | H. M. Fernández | V. Carlino
[1] Eric Pellegrin,et al. Characterization, optimization and surface physics aspects of in situ plasma mirror cleaning. , 2014, Journal of synchrotron radiation.
[2] D. Basko,et al. Raman spectroscopy as a versatile tool for studying the properties of graphene. , 2013, Nature nanotechnology.
[3] S. Vizireanu,et al. Pecvd synthesis of 2d nanostructured carbon material , 2012 .
[4] Rong Yang,et al. Vapour-phase graphene epitaxy at low temperatures , 2012, Nano Research.
[5] R. Solanki,et al. Remote Plasma Assisted Growth of Graphene Films , 2010 .
[6] D. Allred,et al. Use of a commercial RF plasma cleaner in eliminating adventitious carbon contamination in an XPS system , 2008, Microscopy and Microanalysis.
[7] Andre K. Geim,et al. Raman spectrum of graphene and graphene layers. , 2006, Physical review letters.
[8] K. Novoselov,et al. The Raman Fingerprint of Graphene , 2006, cond-mat/0606284.
[9] S. George,et al. Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials , 2006 .
[10] M. Clift,et al. Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics , 2002 .
[11] F. Eggenstein,et al. Cleaning of contaminated XUV-optics at BESSY II , 2001 .
[12] O'Keefe,et al. Plasma Cleaning and Its Applications for Electron Microscopy , 1999, Microscopy and Microanalysis.
[13] Mohamed Chaker,et al. Direct evaluation of the sp3 content in diamond-like-carbon films by XPS , 1998 .
[14] Ferrer,et al. Separation of the sp3 and sp2 components in the C1s photoemission spectra of amorphous carbon films. , 1996, Physical review. B, Condensed matter.
[15] Sven Ulrich,et al. Raman spectroscopy on amorphous carbon films , 1996 .
[16] R. F. Garrett,et al. In situ reactive cleaning of X-ray optics by glow discharge , 1988 .
[17] H. Wise,et al. Diffusion and Heterogeneous Reaction. XI. Diffusion Coefficient Measurements for Gas Mixture of Atomic and Molecular Hydrogen , 1969 .
[18] H. Wise,et al. DIFFUSION AND HETEROGENEOUS REACTION XII. DIFFUSION COEFFICIENT MEASUREMENTS OF ATOMIC OXYGEN THROUGH VARIOUS GASES. , 1968 .
[19] H. Wise. Diffusion Coefficient of Atomic Hydrogen through Multicomponent Mixtures , 1959 .
[20] W. V. Smith. The Surface Recombination of H Atoms and OH Radicals , 1943 .
[21] W. Thowladda,et al. Removal of Carbon Contamination on Silicon Wafer Surfaces by Microwave Oxygen Plasma , 2008 .
[22] Keith N. Rosser,et al. 785 nm Raman Spectroscopy of CVD Diamond Films , 2007 .
[23] Mundiyath Venugopalan,et al. Plasma Chemistry I , 1980 .
[24] F. Segal,et al. A CHARACTERIZATION OF FIBRANT SEGAL CATEGORIES , 2006, math/0603400.