Optical Response Near the Soft X-Ray Absorption Edges and Structural Studies of Low Optical Contrast System Using Soft X-Ray Resonant Reflectivity

Fine structure features of energy-dependent atomic scattering factor near the atomic absorption edge, are used for structural analysis of low-Z containing thin film structures. The scattering contrast undergoes large and abrupt change as the incident photon energy approaches the natural frequency of the atom and is sensitive to variation in atomic composition and atomic density. Soft X-ray resonant reflectivity is utilized for determination of composition at the buried interfaces with subnanometer sensitivity. This is demonstrated through characterization of Mo/Si multilayers near Si L-edge. We also demonstrate the possibility of probing variation of atomic density in thin films, through the characterization of Fe/B4C structure, near B K-edge. Sensitivity of soft X-ray resonant reflectivity to native oxide is demonstrated through characterization of BN films near B K-edge.

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