Method and system for reducing the overlay error in exposure fields by means of APC control strategies

By taking into account plant-specific distortion signatures and retikelspezifischer positioning properties in a Justiersteuerungssystem control quality of modern APC strategies can be significantly improved. Corresponding correction data can be on the basis of combinations of system / reticles and layers to adjust to each other, it is determined which can then modify the corresponding set values ​​of Justierparametern which are used for controlling the adjustment process on the basis of standard overlay metrology data from corresponding overlay marks are obtained.