Study of bake mechanisms by real-time in-situ ellipsometry

Film formation and bake processes have been studied using in-situ ellipsometry. This new experimental set-up based on a HeNe laser mounted over a hot-plate is shown to be mainly sensitive to physical changes in the resist layer and provides real-time monitoring of the modifications induced during bake steps. Pure polymer films as well as DUV 248 nm and 193 nm CA resists are investigated.