An assessment of the process capabilities of nanoimprint lithography

Nanoimprint lithography (NIL) is an emerging nanofabrication tool, able to replicate imprint patterns quickly and at high volumes. The present study was performed in order to define the capabilities of NIL, based on a study of published research and to identify the application areas where NIL has the greatest potential. The process attributes of different NIL process chains were analysed, and their process capabilities were compared to identify trends and process limitations. The attributes chosen include the line width, relief height, initial resist thickness, residual layer thickness, imprint area and line width tolerances. In each case well-defined limits can be identified, which are a direct result of the mechanisms involved in the NIL process. These quantitative results were compared with the assessments of individuals in academia and within the microfabrication industry. The results suggest NIL is most suited to producing photonic, microfluidic and patterned media applications, with photonic applications the closest to market. NIL needs to address overlay alignment issues for wider use, while an analysis is needed for each market, as to whether NIL adds value.

[1]  J. F. Stoddart,et al.  Nanoscale molecular-switch crossbar circuits , 2003 .

[2]  Wei Zhang,et al.  6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography , 2005 .

[3]  Eung-Sug Lee,et al.  Flow behavior at the embossing stage of nanoimprint lithography , 2002 .

[4]  Olivier Joubert,et al.  Uniformity across 200 mm silicon wafers printed by nanoimprint lithography , 2005 .

[5]  Y. Kurashima,et al.  Line Width Reproducibility of Photo-Nanoimprints , 2005 .

[6]  Tianhong Cui,et al.  Fabrication of high-aspect-ratio polymer-based electrostatic comb drives using the hot embossing technique , 2003 .

[7]  Vincent Studer,et al.  Nanoimprint lithography for the fabrication of DNA electrophoresis chips , 2002 .

[8]  Markus Rossi,et al.  Design and fabrication technologies for ultraviolet replicated micro-optics , 2004 .

[9]  Helmut Schift,et al.  Flow behaviour of thin polymer films used for hot embossing lithography , 2000 .

[10]  J. A. Liddle,et al.  One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography , 2005 .

[11]  N. Bogdanski,et al.  Choice of the molecular weight of an imprint polymer for hot embossing lithography , 2005 .

[12]  Lucio Claudio Andreani,et al.  Replication of photonic crystals by soft ultraviolet-nanoimprint lithography , 2006 .

[13]  Fabrication of metallic nano-stamper and replication of nano-patterned substrate for patterned media , 2004 .

[14]  C. Grant Willson,et al.  Low-cost nanostructure patterning using step and flash imprint lithography , 2002, Workshop on Nanostructure Science, Metrology, and Technology.

[15]  N. Bogdanski,et al.  Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography , 2006 .

[16]  R. Schneider,et al.  Wave Printing (I) : Towards Large-Area, Multilayer Microcontact Printing. , 2004 .

[17]  Patrick Schiavone,et al.  Mold deformation in nanoimprint lithography , 2004 .

[18]  Andrew R. Mikkelson,et al.  Simulating fabrication and imprinting distortions in step-and-flash imprint lithography templates , 2004 .

[19]  W. Kim,et al.  Nanopatterning of photonic crystals with a photocurable silica-titania organic-inorganic hybrid material by a UV-based nanoimprint technique , 2005 .

[20]  Wei Zhang,et al.  Sub-10 nm imprint lithography and applications , 1997, 1997 55th Annual Device Research Conference Digest.

[21]  Bernard Choi,et al.  Step and flash imprint lithography: a new approach to high-resolution patterning , 1999, Advanced Lithography.

[22]  Wen-Bin Young,et al.  Analysis of the nanoimprint lithography with a viscous model , 2005 .

[23]  Josep Samitier,et al.  Production of structures for microfluidics using polymer imprint techniques , 2005 .

[24]  Helmut Schift,et al.  Hot embossing in polymers as a direct way to pattern resist , 1998 .

[25]  P. Bai,et al.  A 65nm logic technology featuring 35nm gate lengths, enhanced channel strain, 8 Cu interconnect layers, low-k ILD and 0.57 /spl mu/m/sup 2/ SRAM cell , 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

[26]  Sang-Shin Lee,et al.  Polymeric wavelength filter based on a Bragg grating using nanoimprint technique , 2005, IEEE Photonics Technology Letters.

[27]  Zhongfan Liu,et al.  Nanoimprint lithography for the fabrication of interdigitated cantilever arrays , 2006 .

[28]  Walter J. Trybula,et al.  An analysis: traditional semiconductor lithography versus emerging technology (nano imprint) , 2005, Proceedings of the Winter Simulation Conference, 2005..

[29]  Yugang Zhou,et al.  AlGaN-GaN double-channel HEMTs , 2005, IEEE Transactions on Electron Devices.

[30]  N. Bogdanski,et al.  Temperature-reduced nanoimprint lithography for thin and uniform residual layers , 2005 .

[31]  Ki-Dong Lee,et al.  Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching , 2005 .

[32]  S. Chou,et al.  Roller nanoimprint lithography , 1998 .

[33]  Max C. Lemme,et al.  Large scale ultraviolet-based nanoimprint lithography , 2003 .

[34]  H. Hiroshima,et al.  Step and repeat photo-nanoimprint system using active orientation head , 2003, Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.

[35]  William J. Dauksher,et al.  Development of an etch-definable lift-off process for use with step and flash imprint lithography , 2005, SPIE Advanced Lithography.

[36]  Mingtao Li,et al.  Current status of Nanonex nanoimprint solutions , 2004, SPIE Advanced Lithography.

[37]  Thomas Glinsner,et al.  High resolution lithography with PDMS molds , 2004 .

[38]  S. V. Sreenivasan,et al.  Ramifications of lubrication theory on imprint lithography , 2004 .

[39]  Stephen Y. Chou,et al.  Imprint of sub-25 nm vias and trenches in polymers , 1995 .

[40]  I. Rodríguez,et al.  Isolated, sealed nanofluidic channels formed by combinatorial-mould nanoimprint lithography , 2006 .

[41]  S. Matsui,et al.  Nanoimprint and Lift-Off Process Using Poly(vinyl alcohol) , 2004, Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004..

[42]  B. Stadlober,et al.  Nanoimprinted devices for integrated organic electronics , 2006 .

[43]  Mandy B Esch,et al.  Influence of master fabrication techniques on the characteristics of embossed microfluidic channels. , 2003, Lab on a chip.

[44]  W. Henschel,et al.  Sub-10 nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE electron beam lithography system , 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).

[45]  Heinrich Kurz,et al.  Multiple imprinting in UV-based nanoimprint lithography: related material issues , 2002 .

[46]  Hella-Christin Scheer,et al.  A contribution to the flow behaviour of thin polymer films during hot embossing lithography , 2001 .

[47]  Lei Chen,et al.  Wafer-based nanostructure manufacturing for integrated nanooptic devices , 2005, Journal of Lightwave Technology.

[48]  S. Chou,et al.  Sub-10 nm imprint lithography and applications , 1997 .

[49]  Y. Sim,et al.  Wafer deformation in ultraviolet-nanoimprint lithography using an element-wise patterned stamp , 2005 .

[50]  Wei Wu,et al.  Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography , 2004 .

[51]  William J. Dauksher,et al.  Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography , 2004 .

[52]  S. Zankovych,et al.  Polymer stamps for nanoimprinting , 2002 .

[53]  Lars Montelius,et al.  Nanoimprinted passive optical devices , 2002 .

[55]  S. V. Sreenivasan,et al.  Distortion and overlay performance of UV step and repeat imprint lithography , 2005 .

[56]  Instrumented indentation testing for local characterisation of polymer properties after nanoimprint , 2005 .

[57]  Lars Montelius,et al.  Improving stamps for 10 nm level wafer scale nanoimprint lithography , 2002 .

[58]  Xing Cheng,et al.  A hybrid mask-mould lithography scheme and its application in nanoscale organic thin film transistors. , 2006, Nanotechnology.

[59]  Amy Cha-Tien Sun,et al.  Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography , 2005 .

[60]  Roger T. Bonnecaze,et al.  Simulation of fluid flow in the step and flash imprint lithography process , 2005 .

[61]  F.-C. Hong,et al.  Fabrication of large-scaled organic light emitting devices on the flexible substrates using low-pressure imprinting lithography , 2005, IEEE Transactions on Electron Devices.

[62]  Yong Chen,et al.  Enhanced UV imprint ability with a tri-layer stamp configuration , 2005 .

[63]  Nanoimprint lithography for high aspect ratio patterns , 2004, Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004..

[64]  C. Willson,et al.  Step & flash imprint lithography , 2005 .

[65]  Yoshihiko Hirai,et al.  Fine pattern transfer by nanocasting lithography , 2005 .

[66]  Wei Zhang,et al.  Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels , 2003 .

[67]  Helmut Schift,et al.  Anti-adhesive layers on Nickel stamps for nanoimprint lithography , 2004 .