Avalanche compact model featuring SiGe HBTs characteristics up to BVcbo

The cut-off frequencies of silicon-germanium hetero-junction bipolar transistors (SiGe HBTs) have entered the THz range at the cost of high current density and relatively low breakdown voltages. Typically, the common-emitter breakdown voltage with open base (BVCEO) is used to indicate the allowed breakdown voltage related operation limit. However, an open base (i.e. an infinite source impedance) is rarely encountered in actual circuits, so that BVCEO may be exceeded to a certain extent, maximal up to the open-emitter breakdown voltage BVCBO. Therefore, compact HBT models need to be accurate beyond BVCEO up to BVCBO. In this paper, the enhancement of the avalanche current implemented in the latest version of HICUM/L2 is presented. The model has been validated for different types of advanced SiGe:C HBTs over a wide range of collector-base voltages and temperatures.

[1]  S. L. Miller Avalanche Breakdown in Germanium , 1955 .

[2]  A. G. Chynoweth,et al.  Ionization Rates for Electrons and Holes in Silicon , 1958 .

[3]  P. Chevalier,et al.  Physical and Electrical Performance Limits of High-Speed Si GeC HBTs—Part II: Lateral Scaling , 2011, IEEE Transactions on Electron Devices.

[4]  P. Chevalier,et al.  Physical and Electrical Performance Limits of High-Speed SiGeC HBTs—Part I: Vertical Scaling , 2011, IEEE Transactions on Electron Devices.

[5]  B. Cialdella,et al.  A new extraction method for unit bipolar junction transistor capacitance parameters , 1995, Proceedings International Conference on Microelectronic Test Structures.

[6]  Niccolò Rinaldi,et al.  Avalanche multiplication and pinch-in models for simulating electrical instability effects in SiGe HBTs , 2010, Microelectron. Reliab..

[7]  Bernd Heinemann,et al.  Si/SiGe:C and InP/GaAsSb Heterojunction Bipolar Transistors for THz Applications , 2017, Proceedings of the IEEE.

[8]  W. J. Kloosterman,et al.  A comprehensive bipolar avalanche multiplication compact model for circuit simulation , 2000, Proceedings of the 2000 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.00CH37124).

[9]  P. Chevalier,et al.  A 55 nm triple gate oxide 9 metal layers SiGe BiCMOS technology featuring 320 GHz fT / 370 GHz fMAX HBT and high-Q millimeter-wave passives , 2014, 2014 IEEE International Electron Devices Meeting.

[10]  Hans-Martin Rein,et al.  Influence of impact-ionization-induced instabilities on the maximum usable output voltage of Si-bipolar transistors , 2001 .