Effect of plasma N2 and thermal NH3 nitridation in HfO2 for ultrathin equivalent oxide thickness
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J. Shepard | V. Narayanan | S. Krishnan | M. Chudzik | M. Dai | D. Ioannou | W. Henson | P. Ronsheim | S. Siddiqui | M. Brodsky | Yanfeng Wang | Jinping Liu | C. Reddy