论文信息 - Capillary Z-pinch discharge produced plasma EUV source

Capillary Z-pinch discharge produced plasma EUV source

Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32nrn node and below. This paper elaborately describes the EUV source in our lab based on the capillary Z-pinch discharge produced plasma (DPP).

Qiang Xu | Xingqiang Zhang | Yongpeng Zhao

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