Noise and transport characterisation of tantalum capacitors

Abstract A low frequency noise and charge carrier transport mechanisms were investigated on tantalum capacitors made by various producers. The model of Ta–Ta2O5–MnO2 MIS structure was used to give physical interpretation of I–V characteristics in normal and reverse modes. The noise in time and frequency domain was examined and noise sources were identified. We evaluated correlation between leakage current and noise spectral density and discussed corresponding quality and reliability indicators.