Top Level User Specifications for Mask Inspection Microscope

This document compiles top-level user specifications for an EUV microscope for characterizing EUVL mask defects. Two broad categories of application are considered: (1) emulation of the imaging characteristics of a stepper for printability analysis (AIM mode); and (2) high-resolution imaging for obtaining a more detailed characterization of defects or mask features. It is generally assumed that the mask defects that are to be characterized have been located by a previous inspection procedure and the spatial coordinates of the defect can be transferred to the microscope.