Short-range order in ultrathin film titanium dioxide studied by Raman spectroscopy

It is demonstrated here that nonresonant Raman spectroscopy can be used for unequivocal determination of short-range order in ultrathin films, using different structures of titanium dioxide as the model system. Titania films as thin as 7 nm sputter deposited on 〈111〉 Si have been analyzed and their phase content determined.

[1]  J. Deloach,et al.  Correlation between titania film structure and near ultraviolet optical absorption , 1999 .

[2]  C. Aita Tailored Ceramic Film Growth at Low Temperature by Reactive Sputter Deposition , 1998 .

[3]  Nicolas Martin,et al.  Microstructure modification of amorphous titanium oxide thin films during annealing treatment , 1997 .

[4]  Koichi Toyoda,et al.  Titanium oxide/aluminum oxide multilayer reflectors for "water-window" wavelengths , 1997 .

[5]  S. Shah,et al.  Reactive-sputtering of titanium oxide thin films , 1997 .

[6]  K. No,et al.  Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography. , 1997, Applied optics.

[7]  D. Todorov,et al.  Dielectric properties of TiO2-films reactively sputtered from Ti in an RF magnetron , 1996 .

[8]  R. Tsai,et al.  Microstructural, optical, and mechanical properties of reactive electron-beam-coevaporated TiO(2)-MgF(2) composite films. , 1996, Applied optics.

[9]  Kevin K. H. Chan,et al.  Plasma enhanced chemical vapor deposition of TiO2 in microwave‐radio frequency hybrid plasma reactor , 1995 .

[10]  C. Serna,et al.  Low-temperature nucleation of rutile observed by Raman spectroscopy during crystallization of TiO2 , 1992 .

[11]  A. Kinbara,et al.  Process effects on structural properties of TiO2 thin films by reactive sputtering , 1992 .

[12]  M. Čevro,et al.  Effect of the uv irradiation on the optical properties of MgF2 and TiO2 thin films , 1992 .

[13]  F. Lukes̆,et al.  Characterization of TiO2 and ZrO2 coatings on silica slabs and fibres , 1992 .

[14]  M. Fuyama,et al.  TiO2 / SiO2 Multilayer Insulating Films for ELDs , 1992 .

[15]  T. Kamada,et al.  Structure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method , 1991 .

[16]  Tsunehiro Tanaka,et al.  EXAFS/XANES study of titanium oxide supported on SiO2: A structural consideration on the amorphous state , 1990 .

[17]  H. Sato,et al.  Reactive evaporation of titanium oxide films with controlled Ti/O ratio , 1989 .

[18]  F. P. Fehlner,et al.  Low-temperature oxidation , 1987 .

[19]  K. Guenther,et al.  Physical and chemical aspects in the application of thin films on optical elements. , 1984, Applied optics.

[20]  Y. Lam,et al.  A simple chemical vapour deposition method for depositing thin TiO2 films , 1983 .

[21]  T. Nakayama Structure of TiO2 / SiO2 Multilayer Films , 1994 .

[22]  K. Kosuge Chemistry of non-stoichiometric compounds , 1994 .

[23]  S. Woo,et al.  Preparation and properties of amorphous TiO2 thin films by plasma enhanced chemical vapor deposition , 1994 .

[24]  S. Mohan,et al.  Properties of ion assisted deposited titania films , 1993 .

[25]  L. Cattalini The chemistry of titanium and vanadium. , 1969 .