Mask critical dimension error on optical lithography
暂无分享,去创建一个
[1] Chang-Nam Ahn,et al. Exposure latitude analysis for dense line and space patterns by using diffused aerial image model , 2000, Advanced Lithography.
[2] Chul Shin,et al. Comparison study of mask error effects for various mask-making processes , 1999, Photomask Technology.
[3] Ki-Ho Baik,et al. Novel approximate model for resist process , 1998, Advanced Lithography.
[4] Chang-Nam Ahn,et al. Accuracy of diffused aerial image model for full-chip-level optical proximity correction , 2000, Advanced Lithography.
[5] Chris A. Mack. Impact of Resist on the Mask Error Enhancement Factor , 2002 .
[6] Lars W. Liebmann,et al. Lithographic effects of mask critical dimension error , 1998, Advanced Lithography.