Investigating the Electromechanical Behavior of Unconventionally Ferroelectric Hf0.5Zr0.5O2‐Based Capacitors Through Operando Nanobeam X‐Ray Diffraction
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A. Björling | J. Íñiguez | P. Nukala | B. Noheda | D. Carbone | S. Matzen | Yingfen Wei | M. Salverda | T. Banerjee | H. Aramberri | Binayak Mukherjee | R. Hamming-Green | A. Burema | S. Dutta | E. Stylianidis | P. Surabhi