Fabrication of metal‐epitaxial insulator‐semiconductor field‐effect transistors using molecular beam epitaxy of CaF2 on Si

Fabrication of metal‐epitaxial insulator‐semiconductor field‐effect transistors by molecular beam epitaxial growth of CaF2 on Si is reported for the first time. These devices have a room‐temperature electron mobility of 300 cm2/Vs and a threshold voltage of 0.5 V. The breakdown voltage of the films ranges from ≳105 to ≳106 V/cm in different regions of the film. These devices will be important for the characterization and improvement of the interface transport properties of the CaF2/Si system.